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dc.contributor.authorWang, SCen_US
dc.contributor.authorYeh, CFen_US
dc.contributor.authorHuang, CKen_US
dc.contributor.authorDai, YTen_US
dc.date.accessioned2014-12-08T15:40:19Z-
dc.date.available2014-12-08T15:40:19Z-
dc.date.issued2003-09-15en_US
dc.identifier.issn0021-4922en_US
dc.identifier.urihttp://dx.doi.org/10.1143/JJAP.42.L1044en_US
dc.identifier.urihttp://hdl.handle.net/11536/27529-
dc.description.abstractThis work presents a novel method entitled "device transfer by backside etching (DTBE)" for transferring thin-film devices from Si wafers to a glass or plastic substrate. First, high performance poly-Si thin-film transistors (TFTs) were fabricated on a Si wafer and then adhered to glass or plastic substrates. The remaining Si was removed delicately using wafer. backside chemical-mechanical polishing (CMP) and wet chemical etching. The devices after transferring exhibit comparable electrical characteristics to the original ones on Si substrates. The new transfer scheme has quite attractive applications for fabricating high-quality displays on low-cost substrates with low melting temperatures.en_US
dc.language.isoen_USen_US
dc.subjectthin-film transistoren_US
dc.subjectpoly-Sien_US
dc.subjectglass substrateen_US
dc.subjectplastic substrateen_US
dc.subjectCMPen_US
dc.subjectwet etchingen_US
dc.titleDevice transfer technology by backside etching (DTBE) for poly-Si thin-film transistors on glass/plastic substrateen_US
dc.typeArticleen_US
dc.identifier.doi10.1143/JJAP.42.L1044en_US
dc.identifier.journalJAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERSen_US
dc.citation.volume42en_US
dc.citation.issue9ABen_US
dc.citation.spageL1044en_US
dc.citation.epageL1046en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000185565400003-
dc.citation.woscount8-
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