標題: | A NEW APPROACH TO DETERMINE THE DRAIN-AND-SOURCE SERIES RESISTANCE OF LDD MOSFETS |
作者: | CHUNG, SSS LEE, JS 電子工程學系及電子研究所 Department of Electronics Engineering and Institute of Electronics |
公開日期: | 1-Sep-1993 |
摘要: | A new method for determining the intrinsic drain-and-source series resistance and the effective channel length of LDD MOSFET's is proposed. The method is based on the experimentally measured device I-V characteristics and a new parameter extraction procedure. A consistent set of the effective channel length and the gate-voltage-dependent drain-and-source series resistance was thus determined. The comparison between the measured and experimental drain current characteristics shows excellent agreement using the present model values. |
URI: | http://dx.doi.org/10.1109/16.231580 http://hdl.handle.net/11536/2869 |
ISSN: | 0018-9383 |
DOI: | 10.1109/16.231580 |
期刊: | IEEE TRANSACTIONS ON ELECTRON DEVICES |
Volume: | 40 |
Issue: | 9 |
起始頁: | 1709 |
結束頁: | 1711 |
Appears in Collections: | 期刊論文 |