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dc.contributor.authorWu, YRen_US
dc.contributor.authorSung, WJen_US
dc.contributor.authorLee, SCen_US
dc.contributor.authorLi, TJen_US
dc.contributor.authorLee, WIen_US
dc.date.accessioned2014-12-08T15:46:27Z-
dc.date.available2014-12-08T15:46:27Z-
dc.date.issued1999-07-01en_US
dc.identifier.issn0021-4922en_US
dc.identifier.urihttp://dx.doi.org/10.1143/JJAP.38.4049en_US
dc.identifier.urihttp://hdl.handle.net/11536/31263-
dc.description.abstractThe properties of deep levels found in Mg-doped AlInP, grown by metal-organic chemical vapor deposition, have been studied. Two distinct levels, labeled E1 and E2, were observed, with the activation energy of 0.19 and 0.514 eV, respectively. From distribution profiles measured on trap E1, E2 and Mg-dopant, all three concentration profiles have similar behaviors. The concentration increases gradually from the interface of pn junction. Furthermore, both trap E1 and E2 concentration increase with elevating Mg-dopant concentration Thus, it seems that these deep levels originate from Mg-related defects.en_US
dc.language.isoen_USen_US
dc.subjectMgen_US
dc.subjectAlInPen_US
dc.subjectdefecten_US
dc.subjectdeep levelen_US
dc.subjectDLTSen_US
dc.subjectdepth profile measurementen_US
dc.titleMg-related deep levels in AlInPen_US
dc.typeArticleen_US
dc.identifier.doi10.1143/JJAP.38.4049en_US
dc.identifier.journalJAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERSen_US
dc.citation.volume38en_US
dc.citation.issue7Aen_US
dc.citation.spage4049en_US
dc.citation.epage4050en_US
dc.contributor.department電子物理學系zh_TW
dc.contributor.department友訊交大聯合研發中心zh_TW
dc.contributor.departmentDepartment of Electrophysicsen_US
dc.contributor.departmentD Link NCTU Joint Res Ctren_US
dc.identifier.wosnumberWOS:000083278000019-
dc.citation.woscount4-
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