標題: | CHARACTERISTICS OF TITANIUM SILICIDE FORMED BY SI/MO/TI TRILAYER METALLIZATION |
作者: | CHIOU, BS YANG, BJ CHANG, PH 交大名義發表 電子物理學系 National Chiao Tung University Department of Electrophysics |
公開日期: | 1-Mar-1989 |
URI: | http://dx.doi.org/10.1088/0268-1242/4/3/007 http://hdl.handle.net/11536/4400 |
ISSN: | 0268-1242 |
DOI: | 10.1088/0268-1242/4/3/007 |
期刊: | SEMICONDUCTOR SCIENCE AND TECHNOLOGY |
Volume: | 4 |
Issue: | 3 |
起始頁: | 177 |
結束頁: | 183 |
Appears in Collections: | Articles |
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