標題: CHARACTERISTICS OF TITANIUM SILICIDE FORMED BY SI/MO/TI TRILAYER METALLIZATION
作者: CHIOU, BS
YANG, BJ
CHANG, PH
交大名義發表
電子物理學系
National Chiao Tung University
Department of Electrophysics
公開日期: 1-Mar-1989
URI: http://dx.doi.org/10.1088/0268-1242/4/3/007
http://hdl.handle.net/11536/4400
ISSN: 0268-1242
DOI: 10.1088/0268-1242/4/3/007
期刊: SEMICONDUCTOR SCIENCE AND TECHNOLOGY
Volume: 4
Issue: 3
起始頁: 177
結束頁: 183
Appears in Collections:Articles


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