THE EFFECTS OF THERMAL SILICIDATION ON THE CURRENT TRANSPORT CHARACTERISTICS OF TI/(111)SI SCHOTTKY-BARRIER CONTACTS

標題:	THE EFFECTS OF THERMAL SILICIDATION ON THE CURRENT TRANSPORT CHARACTERISTICS OF TI/(111)SI SCHOTTKY-BARRIER CONTACTS
作者:	TSENG, HH WU, CY 交大名義發表工學院 National Chiao Tung University College of Engineering
公開日期:	1-一月-1988
URI:	http://hdl.handle.net/11536/4578
ISSN:	0038-1101
期刊:	SOLID-STATE ELECTRONICS
Volume:	31
Issue:	1
起始頁:	35
結束頁:	44
顯示於類別：	期刊論文