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dc.contributor.author鄭斌佐en_US
dc.contributor.authorPin-Tso Chengen_US
dc.contributor.author成維華en_US
dc.contributor.authorWei-Hua Chiengen_US
dc.date.accessioned2014-12-12T01:51:16Z-
dc.date.available2014-12-12T01:51:16Z-
dc.date.issued2003en_US
dc.identifier.urihttp://140.113.39.130/cdrfb3/record/nctu/#GT009114578en_US
dc.identifier.urihttp://hdl.handle.net/11536/48057-
dc.description.abstract由於陽極接合(anodic bonding)可以在低溫(<500℃)下將玻璃與矽接合且有很可靠的接合強度,所以相當普遍地用在製造微感測器。陽極接合也用在我們的振動式環形陀螺儀的製造上。但是我們遭遇到非接合區域有些黏結在玻璃上的問題。我們粗糙化非接合區域來改善非接合區域黏結在玻璃上的情形。一開始在深蝕刻過程中我們是用厚膜光阻當作遮罩,但是光阻再流動非常嚴重。這將會影響結構的溝口 (gap) 的寬度和深度我們利用二氧化矽取代厚膜光阻當作蝕刻阻擋層成功地解決了光阻再流動的問題。zh_TW
dc.description.abstractAnodic bonding is a quite popular process used in fabricating micro sensors since it is a glass-to-silicon bonding process with reliable bonding strength in lower temperature (<500℃). It is applied in the fabrication of our vibrating ring gyro, but we suffered the problem that the part of non-bonding region was bonded to glass. We rough the non-bonding region to reduce the situation that non-bonding region was boned to glass. Initially, we used the thick photoresist (PR) as DRIE process mask, but the photoresist reflow is very serious. It will influence the width and the depth of the structural gap. We use SiO2 instead of thick PR as DRIE etching mask and successfully solve the PR reflow problem.en_US
dc.language.isoen_USen_US
dc.subject陽極接合zh_TW
dc.subject深蝕刻zh_TW
dc.subject光阻再流動zh_TW
dc.subjectanodic bondingen_US
dc.subjectDRIEen_US
dc.subjectphotoresist reflowen_US
dc.title振動式環形微陀螺儀接合製程zh_TW
dc.titleBonding Process for the Vibrating Ring Gyroen_US
dc.typeThesisen_US
dc.contributor.department機械工程學系zh_TW
Appears in Collections:Thesis


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