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dc.contributor.author邱鳳城en_US
dc.contributor.authorGIU, FENG-CHENGen_US
dc.contributor.author陳茂傑en_US
dc.contributor.author雷添福en_US
dc.contributor.authorCHEN, MAO-JIEen_US
dc.contributor.authorLEI, TIAN-FUen_US
dc.date.accessioned2014-12-12T02:03:40Z-
dc.date.available2014-12-12T02:03:40Z-
dc.date.issued1985en_US
dc.identifier.urihttp://140.113.39.130/cdrfb3/record/nctu/#NT742430022en_US
dc.identifier.urihttp://hdl.handle.net/11536/52425-
dc.description.abstract本文將對矽化鎢薄膜的備製及其相關特性做詳細之探討。利用雙電子槍蒸鍍系統可將 不同組成的矽化鎢蒸鍍在二氧化矽及複晶矽上,蒸鍍後的矽化鎢薄膜經過300 ℃到11 00℃的各種高溫,配合不同的時間燒結而成。然後,針對各種特性:片電阻,結構變 化,表面狀況,黏附性,離子佈植效應,以及氧化等進行研究和分析。zh_TW
dc.language.isozh_TWen_US
dc.subject矽化鎢zh_TW
dc.subject複晶矽zh_TW
dc.subject蒸鍍zh_TW
dc.title矽化鎢在複晶矽上之備製及其特性zh_TW
dc.typeThesisen_US
dc.contributor.department電子研究所zh_TW
Appears in Collections:Thesis