標題: 半導體廠具兩階綁機特性之派工
Dispatching in a Semiconductor Fab With Two-Stage Machine Dedication Characteristics
作者: 陳煌全
Huang-Quan Chen
巫木誠
Muh-Cherng Wu
工業工程與管理學系
關鍵字: 曝光作業;兩階綁機;達交率;exposure operation;two-stage machine dedication;hit rate
公開日期: 2003
摘要: 現代晶圓製造中,綁機是一個重要的特性,晶圓一旦由某綁機台加工,剩餘的作業皆由該機台加工。過去有些研究已對綁機情境,發展派工演算法。最近,由於半導體設備的進步,出現一個新的特性,稱之為兩階綁機,此特性在過去的文獻裡很少被提到。本研究即針對半導體廠的兩階綁機特性發展派工演算法,績效衡量指標為達交率。模擬實驗結果驗證出,本研究所發展的派工演算法優於其它文獻中派工演算法。
Machine-dedication is an essential feature in modern wafer manufacturing. With this feature, a wafer once processed by a dedicated-machine, in the remaining operations, should be processed by the particular machine. Some research has developed dispatching algorithms for the machine-dedication scenario. Recently, due to advancement of equipment, a new feature (called two-stage machine-dedication) just appear in semiconductor fab and was rarely concerned in literature. This research develops a dispatching algorithm for a semiconductor fab with the feature of two-stage machine-dedication. The performance measure for dispatching is hit-rate (on-time delivery rate). Simulation experiments show that the algorithm outperforms some other representative rules in literature.
URI: http://140.113.39.130/cdrfb3/record/nctu/#GT009133527
http://hdl.handle.net/11536/57490
顯示於類別:畢業論文