| 標題: | 銅化學氣相沉積技術開發與銅金屬化系統之可靠度研究 Development of Cu CVD technology and reliability issue of Cu metallization relevant to ULSI application |
| 作者: | 邱榮照 陳茂傑 電子研究所 |
| 公開日期: | 1994 |
| URI: | http://140.113.39.130/cdrfb3/record/nctu/#NT836430102 http://hdl.handle.net/11536/59944 |
| Appears in Collections: | Thesis |
