标题: | 铜化学气相沉积技术开发与铜金属化系统之可靠度研究 Development of Cu CVD technology and reliability issue of Cu metallization relevant to ULSI application |
作者: | 邱荣照 陈茂杰 电子研究所 |
公开日期: | 1994 |
URI: | http://140.113.39.130/cdrfb3/record/nctu/#NT836430102 http://hdl.handle.net/11536/59944 |
显示于类别: | Thesis |