标题: 铜化学气相沉积技术开发与铜金属化系统之可靠度研究
Development of Cu CVD technology and reliability issue of Cu metallization relevant to ULSI application
作者: 邱荣照
陈茂杰
电子研究所
公开日期: 1994
URI: http://140.113.39.130/cdrfb3/record/nctu/#NT836430102
http://hdl.handle.net/11536/59944
显示于类别:Thesis