標題: Cu-CVD 即時監控系統的製作(I)
The Real Time Monitor and Controller of a Cu-CVD System(I)
作者: 陳乾文
Chen, Chiang-Weng
張隆國
Lon-Kou Chang
電控工程研究所
關鍵字: 銅化學氣相沈積;監控系統;圖形人機介面;Cu-CVD;Monitor;GUI
公開日期: 1996
摘要: 本論文研究之目的乃在於發展一套監控系統,以用於銅化學氣相沈積 系統(Cu-CVD),讓使用者在主電腦端就能對整個銅化學氣相沈積系統進行 操控.本論文中,我們將整個監控系統設計成兩大部份.第一部份是以PC為 主體的監控系統,第二部份則是以Intel 8051 CPU為主體的即時監控介面 電路.在此部份我們使用了三張子監控器,它們是一樣的電路設計,已易於 將來腔體設備的擴充.在主電腦方面,我們完成了一個在Windows 95 作業 系統下的監控軟體. 我們所設計的監控系統具有以下的功能:(1)允許 使用者編輯它們的程序程式.(2)對銅化學氣相沈積系統操作監控.(3)它能 以圖形配合文字的方式來表示各腔體的壓力,溫度,流量,氣閥狀漸H及機器 手臂狀態.讓使用者能輕易得知整個Cu-CVD系統機器本體的狀態.(4)使用 者也可以選擇在"手動"的狀態下直接點選螢幕上的元件來更改狀態. A real time monitor and controller for Cu-CVD system is proposed here. Itprovides a realiable processing for the Cu-CVD system. In our thesis, we designand categorize the whole system into two parts. One is designed in a PC which is used as the host supervisor computer of the whole system. The other is a real time interface controller, which is designed by using the Intel 8051 CPUcircuit. There are three interface controllers designed in this system. They are designed having the same circuits so that one can easily expand them anytime whenever he needs. For the host computer part, we have designed a monitorand control software operated under the Windows 95 operating system. The proposed software has the capabilities of (1)allowing the users to edit their process program,(2)remotely controlling the process of the system, (3)displaying the process status of values, the pressure gauges, the temperaturegauges in both of the text output and graphic output on the screen, and (4)allowing the users to operate the system manually and show the current statusof the system.
URI: http://140.113.39.130/cdrfb3/record/nctu/#NT850327031
http://hdl.handle.net/11536/61686
顯示於類別:畢業論文