快速熱程序系統動態模式建立參數判別與溫度控制

Abstract

本論文針對一套小型RTP系統進行動態模式的建立、系統判別與溫度 控制，藉以瞭解快速熱程序系統實際的溫度動態特性，並建立以PC為主的 基本資料擷取與處理的控制系統。 快速熱程序系統係非線性系統，本 論文利用兩種方式來估算系統的數學模式。第一種方式是根據系統的物理 特性及熱傳學基本觀念來推導系統的熱動態方程式，並在若干參考溫度及 輸入強度下，以泰勒展開的方式將系統線性化。第二種方式是將熱程序工 作溫度範圍分成八個溫階，在各溫階下採用黑箱模型(black-box)的系統 辨識方式，將其視為一線性系統，利用簡單的步階實驗，分別估算出系統 的轉移函數。 溫度控制採用傳統的比例-積分控制。利用中間溫階(第 五個溫階)下的轉移函數，根據吉格爾-尼克的參數調整法則設計PI控制器 參數，並以工業用個人電腦，配合GENIE軟體來實現。經由模擬、實驗結 果顯示，此PI控制器有良好的控制效果，在其他溫階下亦能保持不錯的控 制性能。 Rapid thermal processing is a state-of-the-art technique for performing in a single chamber the necessary wafer fabrication operation in semiconductor manufacture. In this thesis, we consider the modeling, identification and controller design of a rapid thermal processing system in order to have a good knowledge of RTP dynamics. Also, we construct a pc-based data acquisition and processing control system. For control purpose, we should establish the mathematical models of our RTP system at first. Two approaches are used. First, a physics-based model is developed from taking the energy balance of the wafer. In the other, we propose a black-box approach. In a black-box approach, a model that lumps together all these phenomena is identified based purely on input-output data. Then, a proportional plus integral (PI) controller is designed according to the identified model. A industrial pc is used in the experiment in which a GENIE software is used to realize the PI control. Experiments show that the design is satisfactory, and the performance of the controller is well maintained in various conditions.