Microplasma device utilizing SU-8 photoresist as a barrier rib

doi:10.1109/TPS.2008.922939

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DC 欄位	值	語言
dc.contributor.author	Kim, Sung-O	en_US
dc.date.accessioned	2014-12-08T15:11:06Z	-
dc.date.available	2014-12-08T15:11:06Z	-
dc.date.issued	2008-08-01	en_US
dc.identifier.issn	0093-3813	en_US
dc.identifier.uri	http://dx.doi.org/10.1109/TPS.2008.922939	en_US
dc.identifier.uri	http://hdl.handle.net/11536/8509	-
dc.description.abstract	A Microplasma device utilizing SU-8 photoresist as a barrier rib has been fabricated and characterized operating in the abnormal mode for neon pressures from 300 to 800 torr and having a hexagonal structure, 5 x 5 arrays of microplasma. The microplasma device, which has a simple fabrication process, offers advantages such as low firing voltage, low cost, and stable glow discharge. The electrical properties have been examined by bipolar voltage waveforms with different frequencies. The geometric patterns of the barrier rib can be simply changed by lithographic techniques.	en_US
dc.language.iso	en_US	en_US
dc.subject	microdischarge	en_US
dc.title	Microplasma device utilizing SU-8 photoresist as a barrier rib	en_US
dc.type	Article	en_US
dc.identifier.doi	10.1109/TPS.2008.922939	en_US
dc.identifier.journal	IEEE TRANSACTIONS ON PLASMA SCIENCE	en_US
dc.citation.volume	36	en_US
dc.citation.issue	4	en_US
dc.citation.spage	1244	en_US
dc.citation.epage	1245	en_US
dc.contributor.department	光電工程學系	zh_TW
dc.contributor.department	顯示科技研究所	zh_TW
dc.contributor.department	Department of Photonics	en_US
dc.contributor.department	Institute of Display	en_US
dc.identifier.wosnumber	WOS:000258618200192	-
dc.citation.woscount	2	-
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