標題: Investigation on the validity of holding voltage in high-voltage devices measured by transmission-line-pulsing (TLP)
作者: Chen, Wen-Yi
Ker, Ming-Dou
Huang, Yeh-Jen
電子工程學系及電子研究所
Department of Electronics Engineering and Institute of Electronics
關鍵字: bipolar CMOS DMOS (BCD) process;electrostatic discharge (IESD);holding voltage;latch-up;lateral DMOS (LDMOS)
公開日期: 1-七月-2008
摘要: Latch-up is one of the most critical issues in high-voltage (HV) ICs due to the high power-supply voltages. Because the breakdown junction of an HV device is easily damaged by the huge power generated from a dc curve tracer, the device immunity against latch-up is often referred to the transmission-line-pulsing. (TLP)-measured holding voltage. An n-channel lateral DMOS (LDMOS) was fabricated in a 0.25-mu m 18-V bipolar CMOS DMOS process to evaluate the validity of latch-up susceptibility by referring to the holding voltage measured by 100- and 1000-ns TLP systems and curve tracer. Long-pulse TLP measurement reveals the self-heating effect and self-heating speed of the n-channel LDMOS. The self-heating effect results in the TLP system to overestimate the holding voltage of HV n-channel LDMOS. Transient latch-up test is further used to investigate the susceptibility of HV devices to latch-up issue in field applications. As a-result, to judge the latch-up susceptibility of HV devices by holding voltage measured from TLP is insufficient.
URI: http://dx.doi.org/10.1109/LED.2008.2000910
http://hdl.handle.net/11536/8644
ISSN: 0741-3106
DOI: 10.1109/LED.2008.2000910
期刊: IEEE ELECTRON DEVICE LETTERS
Volume: 29
Issue: 7
起始頁: 762
結束頁: 764
顯示於類別:期刊論文


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