| 標題: | Light Enhancement of Silicon-Nanocrystal-Embedded SiO(x) Film on Silicon-on-Insulator Substrate |
| 作者: | Chen, Cheng-Chang Lin, Yung-Hsaing Shih, M. H. Lin, Gong-Ru Kuo, Hao-Chung 光電工程學系 Department of Photonics |
| 公開日期: | 1-四月-2011 |
| 摘要: | We reported the light enhancement from a silicon-nanocrystal-embedded SiO(x) film on a silicon-on-insulator (SOI) substrate in the visible light range. The light emission from the annealed SiO(x) film is one order stronger than the emission from a nonannealed SiO(x) film. Compared with the SiO(x) film on a Si substrate, two-fold enhancement in light emission from the SiO(x) film on a SOI substrate was also observed. The enhancement was attributed to better vertical confinement of optical field in the SiO(x) film on a SOI substrate. (C) 2011 The Japan Society of Applied Physics |
| URI: | http://dx.doi.org/10.1143/JJAP.50.04DJ09 http://hdl.handle.net/11536/9036 |
| ISSN: | 0021-4922 |
| DOI: | 10.1143/JJAP.50.04DJ09 |
| 期刊: | JAPANESE JOURNAL OF APPLIED PHYSICS |
| Volume: | 50 |
| Issue: | 4 |
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| 結束頁: | |
| 顯示於類別: | 期刊論文 |

