具有低介電常數阻障介電薄膜製程整合之研究(II)

標題:	具有低介電常數阻障介電薄膜製程整合之研究(II) Study on the Integration of Barrier Dielectric with Low Dielectric Constant (II)
作者:	施敏 SZE SIMON MIN 國立交通大學電子工程學系
公開日期:	2003
官方說明文件#:	NSC92-2215-E009-019
URI:	http://hdl.handle.net/11536/91846 https://www.grb.gov.tw/search/planDetail?id=873427&docId=167323
Appears in Collections:	Research Plans

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