奈米MOS元件之矽化物、超淺接面及接觸孔之研發(I)

標題:	奈米MOS元件之矽化物、超淺接面及接觸孔之研發(I) Development of Silicide, Ultra-Shallow Junction and Contact Hole in Nano MOS Devices (I)
作者:	雷添福 LEI TAN-FU 交通大學電子工程研究所
公開日期:	2002
官方說明文件#:	NSC91-2215-E009-047
URI:	http://hdl.handle.net/11536/92879 https://www.grb.gov.tw/search/planDetail?id=784415&docId=150773
Appears in Collections:	Research Plans

Files in This Item:

If it is a zip file, please download the file and unzip it, then open index.html in a browser to view the full text content.