自我對準鈷金屬矽化製程之熱穩定性及其對超薄閘極氧化層特性影響之研究

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DC Field	Value	Language
dc.contributor.author	黃調元	en_US
dc.contributor.author	TIAO-YUANHUANG	en_US
dc.date.accessioned	2014-12-13T10:36:17Z	-
dc.date.available	2014-12-13T10:36:17Z	-
dc.date.issued	2000	en_US
dc.identifier.govdoc	NSC89-2215-E009-105	zh_TW
dc.identifier.uri	http://hdl.handle.net/11536/93841	-
dc.identifier.uri	https://www.grb.gov.tw/search/planDetail?id=583894&docId=109708	en_US
dc.description.sponsorship	行政院國家科學委員會	zh_TW
dc.language.iso	zh_TW	en_US
dc.title	自我對準鈷金屬矽化製程之熱穩定性及其對超薄閘極氧化層特性影響之研究	zh_TW
dc.title	Thermeal Stability of Co Salicide and Its Impact on the Characteristics of Ultra-Thin Gate Oxides	en_US
dc.type	Plan	en_US
dc.contributor.department	國立交通大學電子工程學系	zh_TW
Appears in Collections:	Research Plans

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