自我對準鈷金屬矽化製程之熱穩定性及其對超薄閘極氧化層特性影響之研究

標題:	自我對準鈷金屬矽化製程之熱穩定性及其對超薄閘極氧化層特性影響之研究 Thermeal Stability of Co Salicide and Its Impact on the Characteristics of Ultra-Thin Gate Oxides
作者:	黃調元 TIAO-YUANHUANG 國立交通大學電子工程學系
公開日期:	2000
官方說明文件#:	NSC89-2215-E009-105
URI:	http://hdl.handle.net/11536/93841 https://www.grb.gov.tw/search/planDetail?id=583894&docId=109708
Appears in Collections:	Research Plans

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