電子束微影之鄰近效應修正

Title:	電子束微影之鄰近效應修正 Proximity Correction of Electron Beam Lithography
Authors:	龍文安 Loong Wen-an 交通大學應用化學系
Keywords:	電子束;微影術;鄰近效應修正;充電效應;輸出量;E-beam;Lithography;Proximity effect correction;Changing effect;Throughput
Issue Date:	1999
Gov't Doc #:	NSC88-2215-E009-026
URI:	http://hdl.handle.net/11536/94250 https://www.grb.gov.tw/search/planDetail?id=418244&docId=74199
Appears in Collections:	Research Plans