Title: | 電子束微影之鄰近效應修正 Proximity Correction of Electron Beam Lithography |
Authors: | 龍文安 Loong Wen-an 交通大學應用化學系 |
Keywords: | 電子束;微影術;鄰近效應修正;充電效應;輸出量;E-beam;Lithography;Proximity effect correction;Changing effect;Throughput |
Issue Date: | 1999 |
Gov't Doc #: | NSC88-2215-E009-026 |
URI: | http://hdl.handle.net/11536/94250 https://www.grb.gov.tw/search/planDetail?id=418244&docId=74199 |
Appears in Collections: | Research Plans |