| 標題: | 以雷射技術研究大氣化學之重要分子---氟氯烷取代物研究---子計畫II：與OH及Cl之反應速率 Freon Substitutes---Reaction Rates with OH and Cl |
| 作者: | 王念夏 WANG NIANN SHIAH 交通大學應用化學系 |
| 關鍵字: | 氟氯烷取代物;反應速率;氯原子;羥自由基;Freon substitute;Reaction rate;Chlorine atom;Hydroxyl radical |
| 公開日期: | 1999 |
| 官方說明文件#: | NSC88-2113-M009-007-L1 |
| URI: | http://hdl.handle.net/11536/94514 https://www.grb.gov.tw/search/planDetail?id=416981&docId=73900 |
| Appears in Collections: | Research Plans |
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