| 標題: | 以電化學法微細加工同步輻射X光深刻微構件(II) Electrochemical Micromachining of Synchrotron X-Ray Lithographed Microstructure (II) |
| 作者: | 涂肇嘉 交通大學材料科學與工程研究所 |
| 關鍵字: | 同步輻射X光;微細加工;光蝕術;電化學蝕刻;微探針;Synchrotron X-ray;Micromachining;Lithography;Electrochemical etching;Microprobe |
| 公開日期: | 1999 |
| 官方說明文件#: | NSC88-2216-E009-021 |
| URI: | http://hdl.handle.net/11536/94533 https://www.grb.gov.tw/search/planDetail?id=444261&docId=80456 |
| 顯示於類別： | 研究計畫 |
- 以電化學法微細加工紫外光深刻電鑄之微構件 / 余英松;Ing-Song Yu;涂肇嘉;George C. Tu
- 利用X光光刻技術製備凹面型微光柵分光儀之技術研究 / 徐士哲;Shih-Che Hsu;周長彬;Chang-Pin Chou
- High resolution x-ray micromachining using SU-8 resist / Shew, BY;Hung, JT;Huang, TY;Liu, KP;Chou, CP
- Oxygen quenching effect in ultra-deep X-ray lithography with SU-8 resist / Shew, BY;Huang, TY;Liu, KP;Chou, CP
- High precision, low cost mask for deep x-ray lithography / Shew, BY;Cheng, Y;Shih, WP;Lu, M;Lee, WH
- X-ray micromachining SU-8 resist for a terahertz photonic filter / Shew, BY;Li, HC;Pan, CL;Ko, CH
- 以深蝕光刻術製作聚焦環---總計畫 / 蘇翔
- Micromachining program status at the SRRC / Cheng, Y;Shew, BY;Shih, WP;Wang, SS;Lin, CY
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