以電化學法微細加工同步輻射X光深刻微構件(II)

Full metadata record

DC Field	Value	Language
dc.contributor.author	涂肇嘉	en_US
dc.date.accessioned	2014-12-13T10:37:18Z	-
dc.date.available	2014-12-13T10:37:18Z	-
dc.date.issued	1999	en_US
dc.identifier.govdoc	NSC88-2216-E009-021	zh_TW
dc.identifier.uri	http://hdl.handle.net/11536/94533	-
dc.identifier.uri	https://www.grb.gov.tw/search/planDetail?id=444261&docId=80456	en_US
dc.description.sponsorship	行政院國家科學委員會	zh_TW
dc.language.iso	zh_TW	en_US
dc.subject	同步輻射X光	zh_TW
dc.subject	微細加工	zh_TW
dc.subject	光蝕術	zh_TW
dc.subject	電化學蝕刻	zh_TW
dc.subject	微探針	zh_TW
dc.subject	Synchrotron X-ray	en_US
dc.subject	Micromachining	en_US
dc.subject	Lithography	en_US
dc.subject	Electrochemical etching	en_US
dc.subject	Microprobe	en_US
dc.title	以電化學法微細加工同步輻射X光深刻微構件(II)	zh_TW
dc.title	Electrochemical Micromachining of Synchrotron X-Ray Lithographed Microstructure (II)	en_US
dc.type	Plan	en_US
dc.contributor.department	交通大學材料科學與工程研究所	zh_TW
Appears in Collections:	Research Plans