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Showing results 1 to 19 of 19
Issue DateTitleAuthor(s)
1999Anti-reflection strategies for sub-0.18-mu m dual damascene structure patterning in KrF 248nm lithographyChou, SY; Wang, CM; Hsia, CC; Chen, LJ; Hwang, GW; Lee, SD; Lou, JC; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
1-Apr-2005Characteristics of the inter-poly Al(2)O(3) dielectrics on NH(3)-nitrided bottom poly-si for next-generation flash memoriesChen, YY; Chien, CH; Lou, JC; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
1-Apr-2005Characteristics of the inter-poly Al2O3 dielectrics on NH3-nitrided bottom poly-si for next-generation flash memoriesChen, YY; Chien, CH; Lou, JC; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
1-Aug-2005Damage effect of fluorine implantation on PECVD alpha-SiOC barrier dielectricYang, FM; Chang, TC; Liu, PT; Chen, CW; Tai, YH; Lou, JC; 電子工程學系及電子研究所; 光電工程學系; 顯示科技研究所; Department of Electronics Engineering and Institute of Electronics; Department of Photonics; Institute of Display
2005Effects of channel width and NH3 plasma passivation on electrical characteristics of polysilicon thin-film transistors by pattern-dependent metal-induced lateral crystallizationWu, YC; Chang, TC; Chou, CW; Wu, YC; Liu, PT; Tu, CH; Huang, WJ; Lou, JC; Chang, CY; 電子工程學系及電子研究所; 光電工程學系; 顯示科技研究所; Department of Electronics Engineering and Institute of Electronics; Department of Photonics; Institute of Display
15-May-2004Effects of grain boundaries on performance and hot-carrier reliability of excimer-laser annealed polycrystalline silicon thin film transistorsChen, TF; Yeh, CF; Lou, JC; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
2001Evaluating the impact of spherical aberration on sub-0.2-micron contact/via hole patterningChou, SY; Lou, JC; Lai, CM; Liang, FJ; Chen, LJ; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
2005Fabricating thin-film transistors on plastic substrates using spin etching and device transferWang, SC; Yeh, CF; Hsu, CT; Lou, JC; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
2004Fabrication of thin-film transistors on plastic substrates by spin etching and device transfer processWang, SC; Hsu, CT; Yeh, CF; Lou, JC; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
1-Nov-2001Focus latitude enhancement of symmetrical phase mask design for deep submicron contact hole patterningChou, SY; Lou, JC; Chen, LJ; Shiu, LH; Liu, RG; Wang, CM; Gau, TS; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
1995Gate oxynitride grown in N2O and annealed in no using rapid thermal processingSun, SC; Chen, CH; Lou, JC; Yen, LW; Lin, CJ; 電機學院; College of Electrical and Computer Engineering
1-Aug-2003High quality Al2O3IPD with NH3 surface nitridationChen, YY; Chien, CH; Lou, JC; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
15-May-2004Impact of air filter material on metal oxide semiconductor (MOS) device characteristics in HF vapor environmentHsiao, CW; Lou, JC; Yeh, CF; Hsieh, CM; Lin, SJ; Kusumi, T; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
22-Sep-2005An interfacial investigation of high-dielectric constant material hafnium oxide on Si substrateChen, SC; Lou, JC; Chien, CH; Liu, PT; Chang, TC; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
1-Jul-2003Investigation of grain boundary control in the drain junction on laser-crystalized poly-Si thin film transistorsChen, TF; Yeh, CF; Lou, JC; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
3-Oct-2005Mobility enhancement of polycrystalline-Si thin-film transistors using nanowire channels by pattern-dependent metal-induced lateral crystallizationWu, YC; Chang, TC; Liu, PT; Wu, YC; Chou, CW; Tu, CH; Lou, JC; Chang, CY; 電子工程學系及電子研究所; 光電工程學系; 顯示科技研究所; Department of Electronics Engineering and Institute of Electronics; Department of Photonics; Institute of Display
1995MOS characteristics of N2O-grown and NO-annealed oxynitridesSun, SC; Chen, CH; Lou, JC; 奈米中心; Nano Facility Center
1-Jun-2004A novel four-mask-processed poly-Si TFT fabricated using excimer laser crystallization of an edge-thickened alpha-Si active islandChen, TF; Yeh, CF; Liu, CY; Lou, JC; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
2005Process improvement and reliability characteristics of spin-on poly-3-hexylthiophene thin-film transistorWang, SC; Lou, JC; Liou, BL; Lin, RX; Yeh, CF; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
Showing results 1 to 19 of 19