標題: | 12吋矽晶圓半導體CVD製程設備及BST介電薄膜成長研究---總計畫 (I) Research and Development of CVD Process Equipment for a 12-inch Single Silicon Wafer and Growth of BST Dielectric Thin Film(I) |
作者: | 林清發 LIN TSING-FA 國立交通大學機械工程研究所 |
公開日期: | 2000 |
官方說明文件#: | NSC89-2212-E009-078 |
URI: | http://hdl.handle.net/11536/102869 https://www.grb.gov.tw/search/planDetail?id=549676&docId=101492 |
Appears in Collections: | Research Plans |