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DC FieldValueLanguage
dc.contributor.authorLIU Po-Tsunen_US
dc.contributor.authorFAN Yang-Shunen_US
dc.date.accessioned2014-12-16T06:14:50Z-
dc.date.available2014-12-16T06:14:50Z-
dc.date.issued2014-03-06en_US
dc.identifier.govdocH01L045/00zh_TW
dc.identifier.urihttp://hdl.handle.net/11536/104947-
dc.description.abstractA manufacturing method for manufacturing a flexible non-volatile memory is provided. The manufacturing method comprises the steps outlined below. A flexible substrate is provided. A planarization layer is formed on the flexible substrate. A metal bottom electrode layer is deposited on the planarization layer. A mask is formed to define a plurality of patterns. An AZTO layer having a plurality of electrically independent AZTO cells is deposited on the metal bottom electrode layer corresponding to the patterns. A top electrode layer is deposited on the AZTO layer corresponding to the AZTO cells to form a plurality of non-volatile memory cells.zh_TW
dc.language.isozh_TWen_US
dc.titleFLEXIBLE NON-VOLATILE MEMORYzh_TW
dc.typePatentsen_US
dc.citation.patentcountryUSAzh_TW
dc.citation.patentnumber20140061569zh_TW
Appears in Collections:Patents


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