標題: METHOD FOR ADJUSTING A LAYOUT OF AN INTEGRATED CIRCUIT
作者: CHAO Mango C.-T.
CHEN Kuo-An
CHANG Tsung-Wei
公開日期: 20-Feb-2014
摘要: A method for adjusting a layout of an integrated circuit includes a first layer, a second layer, a target metal line, and a first non-target metal line. The integrated circuit is configured for a focused ion beam (FIB) detection to the target metal line. The method includes the steps of: disposing the first non-target metal line on the first layer; disposing the target metal line on the second layer; and adjusting one of the target metal line and the first non-target metal line such that the target metal line can be detected by the FIB detection.
官方說明文件#: G06F017/50
URI: http://hdl.handle.net/11536/104950
專利國: USA
專利號碼: 20140053122
Appears in Collections:Patents


Files in This Item:

  1. 20140053122.pdf

If it is a zip file, please download the file and unzip it, then open index.html in a browser to view the full text content.