| 標題: | METHOD FOR ADJUSTING A LAYOUT OF AN INTEGRATED CIRCUIT |
| 作者: | CHAO Mango C.-T. CHEN Kuo-An CHANG Tsung-Wei |
| 公開日期: | 20-二月-2014 |
| 摘要: | A method for adjusting a layout of an integrated circuit includes a first layer, a second layer, a target metal line, and a first non-target metal line. The integrated circuit is configured for a focused ion beam (FIB) detection to the target metal line. The method includes the steps of: disposing the first non-target metal line on the first layer; disposing the target metal line on the second layer; and adjusting one of the target metal line and the first non-target metal line such that the target metal line can be detected by the FIB detection. |
| 官方說明文件#: | G06F017/50 |
| URI: | http://hdl.handle.net/11536/104950 |
| 專利國: | USA |
| 專利號碼: | 20140053122 |
| 顯示於類別: | 專利資料 |

