標題: | METHOD FOR FABRICATING A RESISTOR FOR A RESISTANCE RANDOM ACCESS MEMORY |
作者: | TSENG Tseung-Yuen Wang Sheng-Yu Tsai Chen-Han |
公開日期: | 14-Jul-2011 |
摘要: | A method for fabricating a resistor for a resistance random access memory (RRAM) includes: (a) forming a first electrode over a substrate; (b) forming a variable resistance layer of zirconium oxide on the first electrode under a working temperature, which ranges from 175° C. to 225° C.; and (c) forming a second electrode of Ti on the variable resistance layer. |
官方說明文件#: | H01L045/00 |
URI: | http://hdl.handle.net/11536/105283 |
專利國: | USA |
專利號碼: | 20110171811 |
Appears in Collections: | Patents |
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