標題: METHOD FOR FABRICATING A RESISTOR FOR A RESISTANCE RANDOM ACCESS MEMORY
作者: TSENG Tseung-Yuen
Wang Sheng-Yu
Tsai Chen-Han
公開日期: 14-七月-2011
摘要: A method for fabricating a resistor for a resistance random access memory (RRAM) includes: (a) forming a first electrode over a substrate; (b) forming a variable resistance layer of zirconium oxide on the first electrode under a working temperature, which ranges from 175° C. to 225° C.; and (c) forming a second electrode of Ti on the variable resistance layer.
官方說明文件#: H01L045/00
URI: http://hdl.handle.net/11536/105283
專利國: USA
專利號碼: 20110171811
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