標題: | Low-K/Cu CMOS-based SoC technology with 115-GHz f(T), 100-GHz f(max), noise 80-nm RF CMOS, high-Q MiM capacitor, and spiral Cu inductor |
作者: | Guo, Jyh-Chyurn 電子工程學系及電子研究所 Department of Electronics Engineering and Institute of Electronics |
關鍵字: | f(max);f(T);inductor;MiM capacitor;NFmin;RF CMOS;varactor |
公開日期: | 1-Aug-2006 |
摘要: | Logic CMOS-based RF technology is introduced for a 10-Gb transceiver in which active and passive RF devices have been realized in a single chip. RF nMOS of 115-GHz f(T), 100-GHz f(max), and sub-1.0-dB NFmin at 10 GHz have been fabricated by aggressive device scaling and layout optimization. High-Q MiM capacitor and spiral Cu inductors have been successfully implemented in the same chip by 0.13-mu m low-K/Cu back end of integration line technology. Core 1.0 V MOS and/or junction varactors for VCO at 10 GHz are offerings free of extra cost and realized by the elaborated layout. |
URI: | http://dx.doi.org/10.1109/TSM.2006.879415 http://hdl.handle.net/11536/11994 |
ISSN: | 0894-6507 |
DOI: | 10.1109/TSM.2006.879415 |
期刊: | IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING |
Volume: | 19 |
Issue: | 3 |
起始頁: | 331 |
結束頁: | 338 |
Appears in Collections: | Articles |
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