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dc.contributor.authorCheng, Chiao-Huaen_US
dc.contributor.authorHung, Shao-Kangen_US
dc.contributor.authorLin, Chih-Hsienen_US
dc.date.accessioned2017-04-21T06:48:52Z-
dc.date.available2017-04-21T06:48:52Z-
dc.date.issued2014en_US
dc.identifier.isbn978-1-4799-7923-3en_US
dc.identifier.issn2373-5422en_US
dc.identifier.urihttp://hdl.handle.net/11536/135884-
dc.description.abstractThis paper proposes a design of a dual-probe profilometer, which successfully utilizes a compensation method with two probe modules to scan a 200 nm step height standard sample with 5% scanning error. Compared with traditional profilometers, this design possesses high scanning precise performance without using large and heavy optical flats to increase the flatness when sample stage is moving. The experimental results show the compensation method is valid and can be applied in nano-scale scanning.en_US
dc.language.isoen_USen_US
dc.subjectnanopositioneren_US
dc.subjectoptical leveren_US
dc.subjectprofilometeren_US
dc.titleDesign of a dual-probe profilometeren_US
dc.typeProceedings Paperen_US
dc.identifier.journal2014 INTERNATIONAL CONFERENCE ON MANIPULATION, MANUFACTURING AND MEASUREMENT ON THE NANOSCALE (3M-NANO)en_US
dc.citation.spage66en_US
dc.citation.epage69en_US
dc.contributor.department機械工程學系zh_TW
dc.contributor.departmentDepartment of Mechanical Engineeringen_US
dc.identifier.wosnumberWOS:000380389000042en_US
dc.citation.woscount0en_US
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