標題: | A Novel Method of Electrical Measurement for Stacking Error in 3D/2.5D Integration |
作者: | Lee, Shih-Wei Kuo, Shu-Chiao Chen, Kuan-Neng 電子工程學系及電子研究所 Department of Electronics Engineering and Institute of Electronics |
關鍵字: | Three-Dimensional (3D) Integration;TSV;Electrical Measurement;Misalignment |
公開日期: | 1-Feb-2018 |
摘要: | A novel method for the inspection of the stacking misalignment in three-dimensional integration circuit (3DIC) by using electrical measurement is proposed. The metal line pattern designed in this paper combined with bump-less TSV fabrication process can successfully detect the direction and quantity of stacking fault. In addition, circuit combined with testing structure can be developed and simulated by using the current mirror concept and offered measurements with better efficiency. |
URI: | http://dx.doi.org/10.1166/jnn.2018.14204 http://hdl.handle.net/11536/144588 |
ISSN: | 1533-4880 |
DOI: | 10.1166/jnn.2018.14204 |
期刊: | JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY |
Volume: | 18 |
起始頁: | 1066 |
結束頁: | 1069 |
Appears in Collections: | Articles |