標題: A Novel Method of Electrical Measurement for Stacking Error in 3D/2.5D Integration
作者: Lee, Shih-Wei
Kuo, Shu-Chiao
Chen, Kuan-Neng
電子工程學系及電子研究所
Department of Electronics Engineering and Institute of Electronics
關鍵字: Three-Dimensional (3D) Integration;TSV;Electrical Measurement;Misalignment
公開日期: 1-Feb-2018
摘要: A novel method for the inspection of the stacking misalignment in three-dimensional integration circuit (3DIC) by using electrical measurement is proposed. The metal line pattern designed in this paper combined with bump-less TSV fabrication process can successfully detect the direction and quantity of stacking fault. In addition, circuit combined with testing structure can be developed and simulated by using the current mirror concept and offered measurements with better efficiency.
URI: http://dx.doi.org/10.1166/jnn.2018.14204
http://hdl.handle.net/11536/144588
ISSN: 1533-4880
DOI: 10.1166/jnn.2018.14204
期刊: JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY
Volume: 18
起始頁: 1066
結束頁: 1069
Appears in Collections:Articles