Title: Polymer-Based Liner TSV Fabrication Scheme and Its Resistance Variation
Authors: Lee, Shih-Wei
Shih, Jian-Yu
Chen, Kuo-Hua
Chiu, Chi-Tsung
Chen, Kuan-Neng
電子工程學系及電子研究所
Department of Electronics Engineering and Institute of Electronics
Keywords: 3D IC;Polymer-Based Liner TSV;Resistance Variation
Issue Date: 1-Jul-2017
Abstract: In this paper, a process scheme for polymer TSV fabrication is proposed to solve the difficulty of polymer liner formation in TSV technology. By using ring trench etching and BCB deposition in a vacuum environment, uniform BCB liner can be successfully fabricated. Electrical measurement by using Kelvin structure is completed to ensure the performance of fabrication. However, a new phenomenon causing tiny resistance changes with the arrangement of TSV is discovered during the measurement of TSV chain. In this research, this effect is discussed in detail by designing different design of experiment (DOE) to pursue good electrical connection and reduce the variance of delay property of each TSV. Based on statistical results, impacts of TSV manufacturing process variance are discussed and the guideline in high density TSV design is found.
URI: http://dx.doi.org/10.1166/jnn.2017.13464
http://hdl.handle.net/11536/145580
ISSN: 1533-4880
DOI: 10.1166/jnn.2017.13464
Journal: JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY
Volume: 17
Begin Page: 4712
End Page: 4715
Appears in Collections:Articles