標題: Polymer-Based Liner TSV Fabrication Scheme and Its Resistance Variation
作者: Lee, Shih-Wei
Shih, Jian-Yu
Chen, Kuo-Hua
Chiu, Chi-Tsung
Chen, Kuan-Neng
電子工程學系及電子研究所
Department of Electronics Engineering and Institute of Electronics
關鍵字: 3D IC;Polymer-Based Liner TSV;Resistance Variation
公開日期: 1-Jul-2017
摘要: In this paper, a process scheme for polymer TSV fabrication is proposed to solve the difficulty of polymer liner formation in TSV technology. By using ring trench etching and BCB deposition in a vacuum environment, uniform BCB liner can be successfully fabricated. Electrical measurement by using Kelvin structure is completed to ensure the performance of fabrication. However, a new phenomenon causing tiny resistance changes with the arrangement of TSV is discovered during the measurement of TSV chain. In this research, this effect is discussed in detail by designing different design of experiment (DOE) to pursue good electrical connection and reduce the variance of delay property of each TSV. Based on statistical results, impacts of TSV manufacturing process variance are discussed and the guideline in high density TSV design is found.
URI: http://dx.doi.org/10.1166/jnn.2017.13464
http://hdl.handle.net/11536/145580
ISSN: 1533-4880
DOI: 10.1166/jnn.2017.13464
期刊: JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY
Volume: 17
起始頁: 4712
結束頁: 4715
Appears in Collections:Articles