Title: Impacts of Multiple Strain-Gate Engineering on a Zero-Temperature-Coefficient Point
Authors: Chang, Tien-Shun
Lu, Tsung Yi
Chao, Tien-Sheng
交大名義發表
National Chiao Tung University
Keywords: Mobility;nMOSFETs;strain;temperature;zero-temperature-coefficient (ZTC) point
Issue Date: 1-Apr-2013
Abstract: The impacts of zero-temperature-coefficient (ZTC) points of various strained devices is presented in this letter. The current and mobility are reduced at high temperature by phonon scattering. The degree of mobility reduction becomes severe on devices with multiple strain-gate engineering. The reduction of mobility becomes severe as a result of impurity scattering, which results from gate implantation impurities. The ZTC point is decreased by multiple strain-gate engineering due to the decreased Vth.
URI: http://dx.doi.org/10.1109/LED.2013.2247736
http://hdl.handle.net/11536/21711
ISSN: 0741-3106
DOI: 10.1109/LED.2013.2247736
Journal: IEEE ELECTRON DEVICE LETTERS
Volume: 34
Issue: 4
Begin Page: 481
End Page: 483
Appears in Collections:Articles


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