標題: Ultralow-Power Ni/GeO/STO/TaN Resistive Switching Memory
作者: Cheng, C. H.
Chin, Albert
Yeh, F. S.
電子工程學系及電子研究所
Department of Electronics Engineering and Institute of Electronics
關鍵字: GeO(2);resistive random access memory (RRAM);SrTiO(3) (STO)
公開日期: 1-九月-2010
摘要: Using novel stacked covalent-bond-dielectric GeO(x) (GeO) on metal-oxide SrTiO(3) to form a cost-effective Ni/GeO/SrTiO/TaN resistive switching memory, an ultralow set power of small 4 mu W (3.5 mu A at 1.1 V), a reset power of 16 pW (0.12 nA at 0.13 V), and a large 10(6) memory window for 10(5)-s retention at 85 degrees C are realized for the first time. A positive temperature coefficient is measured at low-resistance state and different from the metallic filament in metal-oxide resistive random access memory.
URI: http://dx.doi.org/10.1109/LED.2010.2055828
http://hdl.handle.net/11536/32243
ISSN: 0741-3106
DOI: 10.1109/LED.2010.2055828
期刊: IEEE ELECTRON DEVICE LETTERS
Volume: 31
Issue: 9
起始頁: 1020
結束頁: 1022
顯示於類別:期刊論文


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