標題: | Ultralow-Power Ni/GeO/STO/TaN Resistive Switching Memory |
作者: | Cheng, C. H. Chin, Albert Yeh, F. S. 電子工程學系及電子研究所 Department of Electronics Engineering and Institute of Electronics |
關鍵字: | GeO(2);resistive random access memory (RRAM);SrTiO(3) (STO) |
公開日期: | 1-九月-2010 |
摘要: | Using novel stacked covalent-bond-dielectric GeO(x) (GeO) on metal-oxide SrTiO(3) to form a cost-effective Ni/GeO/SrTiO/TaN resistive switching memory, an ultralow set power of small 4 mu W (3.5 mu A at 1.1 V), a reset power of 16 pW (0.12 nA at 0.13 V), and a large 10(6) memory window for 10(5)-s retention at 85 degrees C are realized for the first time. A positive temperature coefficient is measured at low-resistance state and different from the metallic filament in metal-oxide resistive random access memory. |
URI: | http://dx.doi.org/10.1109/LED.2010.2055828 http://hdl.handle.net/11536/32243 |
ISSN: | 0741-3106 |
DOI: | 10.1109/LED.2010.2055828 |
期刊: | IEEE ELECTRON DEVICE LETTERS |
Volume: | 31 |
Issue: | 9 |
起始頁: | 1020 |
結束頁: | 1022 |
顯示於類別: | 期刊論文 |