標題: 次微米互補式金氧半鎖定及基座偏壓產生器
Submicron CMOS Latch-up and Substrate Bias Generators
作者: 周業輝
Yeh-Huei Jou
陳明哲
Ming-Jer Chen
電子研究所
關鍵字: 次微米;互補式;金氧半;鎖定;偏壓;Submicron;Complementary;MOS;Latch-up;Bias
公開日期: 1994
摘要:   本論文主要在探討次微米互補式金氧半的『鎖定效應』,從其物理特 性作一通盤性的膫解,並針對工業界對鎖住電壓提升的渴望著手。因此我 們利用半導體元件模擬軟體 MEDICI, 模擬了各式各樣的結構。在固定製 程參數下,改變磊晶層的厚度、n+/p+ 間的距離、基座偏壓...等,試圖來 提升鎖住電壓。我們也從模擬結果中萃取出鎖定曲線的三區兩點(堵塞區 、負電阻區、鎖定區;及激發點、鎖住點)中的各項物理參數來進行分析 。並針對鎖住點附近的物理特性類似 p-i-n 結構, 從中推導出鎖住電壓 的模型。另外,我們在國際間鎖定的標準量測規範下, 建立了一套鎖定的 量測系統及量測方法,並對鎖住效應提出一些設計規則。在基座偏壓產生 器方面我們利用電荷幫浦原理,設計並製造出一組可以提供晶片內正/負偏 壓的偏壓產生器。應用於一般的互補式金氧半晶片上將可大大地提高鎖住 電壓。 The essential study of this thesis is on the submicron CMOS latch-up effect. We can draw a general understanding of the physical characteristics of latch-up, with an aim to raise the holding voltage for meeting the industrial requirements. Thus, we utilize the semiconductor device simulator MEDICI to analyze various configurations. Under the fixed process parameter, we change the epitaxial layer thickness, n+/p+ spacing, substrate bias...etc, in order to raise the holding voltage. Further, we separate the latch-up curve into the "three sub- regions/two points" based on the simulation results.Thus various physical parameters can be extracted for study and analysis. In the vicinity of holding point where the physical mechanism is like a p-i-n diode structure, we have derived a holding voltage model. On the other hand,by following the international standard latch-up test guidelines, we set up a latch-up test system and methodology. At the same time, we propose a design rule for latch-up robustness. In substrate bias generator, we utilize charge pumping principle, and design and fabricate a set of bias generator to support on chip a positive/negative bias. Applying it to the CMOS chip will raise the holding voltage efficiently.
URI: http://140.113.39.130/cdrfb3/record/nctu/#NT830430101
http://hdl.handle.net/11536/59294
Appears in Collections:Thesis