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dc.contributor.author邱碧秀en_US
dc.contributor.authorCHIOU BI-SHIOUen_US
dc.date.accessioned2014-12-13T10:30:32Z-
dc.date.available2014-12-13T10:30:32Z-
dc.date.issued2000en_US
dc.identifier.govdocNSC89-2216-E009-017zh_TW
dc.identifier.urihttp://hdl.handle.net/11536/90308-
dc.identifier.urihttps://www.grb.gov.tw/search/planDetail?id=720602&docId=135385en_US
dc.description.sponsorship行政院國家科學委員會zh_TW
dc.language.isozh_TWen_US
dc.title高密度多層構裝基板與接合材料研究---子計畫II:銅接合-低介電係數介電層之界面可靠度提升研究zh_TW
dc.titleReliability Enhancement for Copper Interconnect-Low K Dielectric Interconnecten_US
dc.typePlanen_US
dc.contributor.department交通大學電子工程系zh_TW
Appears in Collections:Research Plans


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