| Title: | 銅化學氣相沈積技術及積體電路銅製程相關的材料與製程技術研究(II) Cu-CVD Technology and Reliability Issues of Cu Metallization Relevant to ULSI Application (II) |
| Authors: | 陳茂傑 國立交通大學電子工程學系 |
| Issue Date: | 2000 |
| Gov't Doc #: | NSC89-2215-E009-101 |
| URI: | http://hdl.handle.net/11536/93859 https://www.grb.gov.tw/search/planDetail?id=583878&docId=109704 |
| Appears in Collections: | Research Plans |
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