標題: 電子束微影之鄰近效應修正
Proximity Correction of Electron Beam Lithography
作者: 龍文安
Loong Wen-an
交通大學應用化學系
關鍵字: 電子束;微影術;鄰近效應修正;充電效應;輸出量;E-beam;Lithography;Proximity effect correction;Changing effect;Throughput
公開日期: 1999
官方說明文件#: NSC88-2215-E009-026
URI: http://hdl.handle.net/11536/94250
https://www.grb.gov.tw/search/planDetail?id=418244&docId=74199
Appears in Collections:Research Plans