穿隧氧化層內漏電流之暫態特性與物理機制

Full metadata record

DC Field	Value	Language
dc.contributor.author	汪大暉	en_US
dc.contributor.author	WANG TAHUI	en_US
dc.date.accessioned	2014-12-13T10:37:11Z	-
dc.date.available	2014-12-13T10:37:11Z	-
dc.date.issued	1999	en_US
dc.identifier.govdoc	NSC88-2215-E009-034	zh_TW
dc.identifier.uri	http://hdl.handle.net/11536/94450	-
dc.identifier.uri	https://www.grb.gov.tw/search/planDetail?id=444198&docId=80441	en_US
dc.description.sponsorship	行政院國家科學委員會	zh_TW
dc.language.iso	zh_TW	en_US
dc.subject	氧化層漏電流	zh_TW
dc.subject	暫態特性	zh_TW
dc.subject	物理機制	zh_TW
dc.subject	快閃記憶體	zh_TW
dc.subject	穿隧氧化層	zh_TW
dc.subject	Stress induced leakage current (SILC)	en_US
dc.subject	Transient characteristic	en_US
dc.subject	Mechanism	en_US
dc.subject	Flash EEPROM	en_US
dc.subject	Tunnel oxide	en_US
dc.title	穿隧氧化層內漏電流之暫態特性與物理機制	zh_TW
dc.title	Mechanisms and Transient Characteristics of Stress Induced Leakage Current (SILC) in Tunnel Oxides	en_US
dc.type	Plan	en_US
dc.contributor.department	交通大學電子工程系	zh_TW
Appears in Collections:	Research Plans

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