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20-二月-1995BOND-STRUCTURE CHANGES OF LIQUID-PHASE DEPOSITED OXIDE (SIO2-XFX) ON N2 ANNEALINGYEH, CF; CHEN, CL; LUR, W; YEN, PW; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
1-二月-1995CHARACTERISTICS OF SELF-INDUCED LIGHTLY-DOPED-DRAIN POLYCRYSTALLINE SILICON THIN-FILM TRANSISTORS WITH LIQUID-PHASE DEPOSITION SIO2 AS GATE-INSULATOR AND PASSIVATION-LAYERYEH, CF; YANG, TZ; CHEN, TJ; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
1-六月-1993THE CHARACTERIZATION OF AL2O3 PREPARED BY ANODIC-OXIDATIONYEH, CF; CHENG, JY; LU, JH; 交大名義發表; 電控工程研究所; National Chiao Tung University; Institute of Electrical and Control Engineering
1-九月-1995CHARACTERIZATION OF THE CHEMICAL-MECHANICAL POLISHING PROCESS-BASED ON NANOINDENTATION MEASUREMENT OF DIELECTRIC FILMSLIU, CW; DAI, BT; YEH, CF; 電子工程學系及電子研究所; 奈米中心; Department of Electronics Engineering and Institute of Electronics; Nano Facility Center
1-十月-1995CONTROLLING FLUORINE CONCENTRATION AND THERMAL ANNEALING EFFECT ON LIQUID-PHASE DEPOSITED SIO2-XFX FILMSYEH, CF; CHEN, CL; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
1-九月-1992THE EFFECT OF TEMPERATURE ON I-V-CHARACTERISTICS OF A-SI-H PHOTODIODECHANG, KL; YEH, CF; 交大名義發表; 電控工程研究所; National Chiao Tung University; Institute of Electrical and Control Engineering
1-七月-1995EFFECTS OF PLASMA TREATMENT ON THE PROPERTIES OF ROOM-TEMPERATURE LIQUID-PHASE DEPOSITED (LPD) OXIDE-FILMSYEH, CF; LIN, SS; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
1-十月-1993EXPERIMENTAL COMPARISON OF OFF-STATE CURRENT BETWEEN HIGH-TEMPERATURE-PROCESSED AND LOW-TEMPERATURE-PROCESSED UNDOPED CHANNEL POLYSILICON THIN-FILM TRANSISTORSYEH, CF; YANG, TZ; CHEN, CL; CHEN, TJ; YANG, YC; 電控工程研究所; Institute of Electrical and Control Engineering
1-六月-1995FABRICATION OF MOSFETS USING LOW-TEMPERATURE LIQUID-PHASE DEPOSITED OXIDEYEH, CF; LIN, SS; HONG, TY; 交大名義發表; 電子工程學系及電子研究所; National Chiao Tung University; Department of Electronics Engineering and Institute of Electronics
1-一月-1994IMPROVED IV-CHARACTERISTICS OF POLYSILICON THIN-FILM TRANSISTORS WITH NOVEL DUAL-BUFFER DRAIN STRUCTUREYEH, CF; CHERN, CH; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
1-十月-1993INVESTIGATION OF SI-SIO2 INTERFACE PROPERTIES FOR BONDED SILICON-ON-INSULATORYEH, CF; KAO, HW; CHANG, BS; CHANG, KL; 交大名義發表; 電控工程研究所; National Chiao Tung University; Institute of Electrical and Control Engineering
1-二月-1992INVESTIGATION OF THERMAL COEFFICIENT FOR POLYCRYSTALLINE SILICON THERMAL SENSOR DIODEYEH, CF; LIN, SS; YANG, GP; 交大名義發表; 電控工程研究所; National Chiao Tung University; Institute of Electrical and Control Engineering
1-七月-1995LOW-TEMPERATURE PROCESSED MOSFETS WITH LIQUID-PHASE DEPOSITED SIO2-XFX AS GATE INSULATORYEH, CF; LIN, SS; HONG, TY; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
1-四月-1994LOW-TEMPERATURE-PROCESSED POLY-SI THIN-FILM TRANSISTORS USING SOLID-PHASE-CRYSTALLIZED AND LIQUID-PHASE-DEPOSITED GATE OXIDEYEH, CF; CHEN, CL; YANG, YC; LIN, SS; YANG, TZ; HONG, TY; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
1-五月-1992THE NOVEL PREPARATION OF P-N-JUNCTION MESA DIODES BY SILICON-WAFER DIRECT BONDING (SDB)YEH, CF; SHYANG, HL; 電控工程研究所; 光電工程學系; Institute of Electrical and Control Engineering; Department of Photonics
1-八月-1993NOVEL TECHNIQUE FOR SIO2 FORMED BY LIQUID-PHASE DEPOSITION FOR LOW-TEMPERATURE PROCESSED POLYSILICON TFTYEH, CF; LIN, SS; CHEN, CL; YANG, YC; 電控工程研究所; Institute of Electrical and Control Engineering
1-二月-1994PERFORMANCE AND OFF-STATE CURRENT MECHANISMS OF LOW-TEMPERATURE PROCESSED POLYSILICON THIN-FILM TRANSISTORS WITH LIQUID-PHASE DEPOSITED SIO2 GATE INSULATORYEH, CF; LIN, SS; YANG, TZ; CHEN, CL; YANG, YC; 電控工程研究所; Institute of Electrical and Control Engineering
1-十一月-1994THE PHYSICOCHEMICAL PROPERTIES AND GROWTH-MECHANISM OF OXIDE (SIO2-XFX) BY LIQUID-PHASE DEPOSITION WITH H2O ADDITION ONLYYEH, CF; CHEN, CL; LIN, GH; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
1-六月-1994ROOM-TEMPERATURE SELECTIVE GROWTH OF DIELECTRIC FILMS BY LIQUID-PHASE DEPOSITIONYEH, CF; CHEN, CL; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
1-十一月-1995THINNER LIQUID-PHASE DEPOSITED OXIDE FOR POLYSILICON THIN-FILM TRANSISTORSYEH, CF; LIN, SS; FAN, CL; 交大名義發表; 電子工程學系及電子研究所; National Chiao Tung University; Department of Electronics Engineering and Institute of Electronics
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