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dc.contributor.authorShih, Jian-Yuen_US
dc.contributor.authorChen, Yen-Chien_US
dc.contributor.authorChiu, Chih-Hungen_US
dc.contributor.authorHu, Yu-Chenen_US
dc.contributor.authorLo, Chung-Lunen_US
dc.contributor.authorChang, Chi-Chungen_US
dc.contributor.authorChen, Kuan-Nengen_US
dc.date.accessioned2014-12-08T15:31:58Z-
dc.date.available2014-12-08T15:31:58Z-
dc.date.issued2013-08-01en_US
dc.identifier.issn0741-3106en_US
dc.identifier.urihttp://dx.doi.org/10.1109/LED.2013.2265335en_US
dc.identifier.urihttp://hdl.handle.net/11536/22575-
dc.description.abstractAn advanced crystal resonator device scheme using Cu through-silicon via (TSV), 3-D integration, and Si packaging technologies is successfully demonstrated. In addition to robust structural quality, the crystal resonator packaging has excellent electrical characteristics of low leakage current and reliability against harsh environment for MIL-STD-883 hermetic encapsulation. Using 3-D integration technologies and Si packaging, the proposed TSV-based crystal resonator device possesses the manufacturability potential while conventional ones using a metal lid or ceramic enclosure.en_US
dc.language.isoen_USen_US
dc.subject3-D integrationen_US
dc.subjectcrystal resonator through-silicon via (TSV)en_US
dc.titleAdvanced TSV-Based Crystal Resonator Devices Using 3-D Integration Scheme With Hermetic Sealingen_US
dc.typeArticleen_US
dc.identifier.doi10.1109/LED.2013.2265335en_US
dc.identifier.journalIEEE ELECTRON DEVICE LETTERSen_US
dc.citation.volume34en_US
dc.citation.issue8en_US
dc.citation.spage1041en_US
dc.citation.epage1043en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000323911800036-
dc.citation.woscount3-
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