標題: | Substrate-triggered technique for on-chip ESD protection design in a 0.18-mu m salicided CMOS process |
作者: | Ker, MD Chen, TY 電子工程學系及電子研究所 Department of Electronics Engineering and Institute of Electronics |
關鍵字: | electrostatic discharge (ESD);ESD protection circuits;gate-driven technique;second breakdown;substrate-triggered technique |
公開日期: | 1-四月-2003 |
摘要: | The substrate triggered technique for input, output, and power-rail electrostatic discharge (ESD) protection, as,comparing to the traditional gate-driven technique, has been proposed to effectively improve ESD robustness of IC products. With the substrate-triggered technique, on-chip ESD protection circuits tor the input, output, and power pins have been designed and verified in a 0.18-mum salicided CMOS process. The experimental results have confirmed that the proposed substrate-triggered design can effectively and continually improve ESD robustness of CMOS devices. The humari-body-model (HUM) ESD robustness of NMOS with a device dimension of W/L = 300 mum/0.3 mum can be improved from the original 0.65 kV with the traditional gate-driven design to become 3.2 kV with the proposed substrate-triggered design. |
URI: | http://dx.doi.org/10.1109/TED.2003.812495 http://hdl.handle.net/11536/27983 |
ISSN: | 0018-9383 |
DOI: | 10.1109/TED.2003.812495 |
期刊: | IEEE TRANSACTIONS ON ELECTRON DEVICES |
Volume: | 50 |
Issue: | 4 |
起始頁: | 1050 |
結束頁: | 1057 |
顯示於類別: | 期刊論文 |