標題: Substrate-triggered technique for on-chip ESD protection design in a 0.18-mu m salicided CMOS process
作者: Ker, MD
Chen, TY
電子工程學系及電子研究所
Department of Electronics Engineering and Institute of Electronics
關鍵字: electrostatic discharge (ESD);ESD protection circuits;gate-driven technique;second breakdown;substrate-triggered technique
公開日期: 1-四月-2003
摘要: The substrate triggered technique for input, output, and power-rail electrostatic discharge (ESD) protection, as,comparing to the traditional gate-driven technique, has been proposed to effectively improve ESD robustness of IC products. With the substrate-triggered technique, on-chip ESD protection circuits tor the input, output, and power pins have been designed and verified in a 0.18-mum salicided CMOS process. The experimental results have confirmed that the proposed substrate-triggered design can effectively and continually improve ESD robustness of CMOS devices. The humari-body-model (HUM) ESD robustness of NMOS with a device dimension of W/L = 300 mum/0.3 mum can be improved from the original 0.65 kV with the traditional gate-driven design to become 3.2 kV with the proposed substrate-triggered design.
URI: http://dx.doi.org/10.1109/TED.2003.812495
http://hdl.handle.net/11536/27983
ISSN: 0018-9383
DOI: 10.1109/TED.2003.812495
期刊: IEEE TRANSACTIONS ON ELECTRON DEVICES
Volume: 50
Issue: 4
起始頁: 1050
結束頁: 1057
顯示於類別:期刊論文


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