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公開日期標題作者
1-二月-1990ELLIPSOMETRY MEASUREMENT OF THE COMPLEX REFRACTIVE-INDEX AND THICKNESS OF POLYSILICON THIN-FILMSHO, JH; LEE, CL; LEI, TF; CHAO, TS; 交大名義發表; 電控工程研究所; National Chiao Tung University; Institute of Electrical and Control Engineering
1-八月-1990ELLIPSOMETRY MEASUREMENTS ON REFRACTIVE-INDEX PROFILES OF THIN-FILMSHO, JH; LEE, CL; LEI, TF; 交大名義發表; 電控工程研究所; National Chiao Tung University; Institute of Electrical and Control Engineering
1-九月-1987ELLIPSOMETRY MEASUREMENTS ON SIO2-FILMS FOR THICKNESSES UNDER 200-AHO, JH; LEE, CL; JEN, CW; LEI, TF; 交大名義發表; 電控工程研究所; National Chiao Tung University; Institute of Electrical and Control Engineering
1-六月-1995ENHANCED H-2-PLASMA EFFECTS ON POLYSILICON THIN-FILM TRANSISTORS WITH THIN ONO GATE-DIELECTRICSYANG, CK; LEE, CL; LEI, TF; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
15-八月-1993THE ENHANCED STARK EFFECTS OF COUPLED QUANTUM-WELLS AND THEIR APPLICATION TO TUNABLE IR PHOTODETECTORSHUANG, YM; LIEN, CH; LEI, TF; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
1-四月-1994ENHANCEMENT OF OXIDE BREAK-UP BY IMPLANTATION OF FLUORINE IN POLY-SI EMITTER CONTACTED P-+-N SHALLOW JUNCTION FORMATIONWU, SL; LEE, CL; LEI, TF; CHEN, CF; CHEN, LJ; HO, KZ; LING, YC; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
1-八月-1988ERROR REDUCTION IN THE ELLIPSOMETRIC MEASUREMENT ON THIN-FILMSHO, JH; LEE, CL; LEI, TF; 交大名義發表; 電控工程研究所; National Chiao Tung University; Institute of Electrical and Control Engineering
1-五月-1995FOURIER-TRANSFORM INFRARED SPECTROSCOPIC STUDY OF OXIDE-FILMS GROWN IN PURE N2OCHAO, TS; CHEN, WH; LEI, TF; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
6-九月-1993GROWTH OF UNDOPED POLYCRYSTALLINE SI BY AN ULTRAHIGH-VACUUM CHEMICAL-VAPOR-DEPOSITION SYSTEMLIN, HC; LIN, HY; CHANG, CY; LEI, TF; WANG, PJ; CHAO, CY; 機械工程學系; 電控工程研究所; Department of Mechanical Engineering; Institute of Electrical and Control Engineering
1-三月-1993H-2/O-2 PLASMA ON POLYSILICON THIN-FILM TRANSISTORCHERN, HN; LEE, CL; LEI, TF; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
26-十月-1995HIGH BREAKDOWN VOLTAGE SCHOTTKY-BARRIER DIODE USING P(+)-POLYCRYSTALLINE SILICON DIFFUSED GUARD RINGLIOU, BW; LEE, CL; LEI, TF; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
25-五月-1995HIGH-BARRIER PT/AL/N-INP DIODEHUANG, WC; LEI, TF; LEE, CL; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
1-一月-1992HIGH-PERFORMANCE POLYSILICON CONTACTED SHALLOW JUNCTIONS FORMED BY STACKED-AMORPHOUS-SILICON FILMSWU, SL; LEE, CL; LEI, TF; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
1-一月-1993THE IMPACT OF TITANIUM SILICIDE ON THE CONTACT RESISTANCE FOR SHALLOW JUNCTION FORMED BY OUT-DIFFUSION OF ARSENIC FROM POLYSILICONYANG, WL; LEI, TF; HUANG, CT; LEE, CL; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
1994IMPROVED ELECTRICAL CHARACTERISTICS OF THIN-FILM TRANSISTORS FABRICATED ON NITROGEN-IMPLANTED POLYSILICON FILMSYANG, CK; LEI, TF; LEE, CL; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
29-十月-1990IMPROVEMENT OF ELECTRICAL CHARACTERISTICS OF POLYCRYSTALLINE SILICON-CONTACTED DIODES AFTER FORWARD BIAS STRESSINGWU, SL; LEE, CL; LEI, TF; 交大名義發表; 電控工程研究所; National Chiao Tung University; Institute of Electrical and Control Engineering
1-五月-1994IMPROVEMENT OF POLYSILICON OXIDE CHARACTERISTICS BY FLUORINE INCORPORATIONCHERN, HN; LEE, CL; LEI, TF; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
12-三月-1990IMPROVEMENT ON THE CURRENT-VOLTAGE CHARACTERISTICS OF POLYCRYSTALLINE SILICON CONTACTED N+-P JUNCTIONS WITH HIGH-FIELD STRESSINGWU, SL; LEE, CL; LEI, TF; 交大名義發表; 電控工程研究所; National Chiao Tung University; Institute of Electrical and Control Engineering
16-二月-1995INHIBITION OF BIRDS BEAK IN LOCOS BY NEW BUFFER N2O OXIDECHAO, TS; CHENG, JY; LEI, TF; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
1-六月-1995INVESTIGATION ON THE DISTRIBUTION OF FLUORINE AND BORON IN POLYCRYSTALLINE SILICON SILICON SYSTEMSCHEN, TP; LEI, TF; CHANG, CY; HSIEH, WY; CHEN, LJ; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics