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公開日期標題作者
1-七月-1994DEPOSITION OF MOLYBDENUM CARBONITRIDE THIN-FILMS FROM MO(NBUT)2(NHBUT)2CHIU, HT; HO, WY; CHUANG, SH; 交大名義發表; 應用化學系; National Chiao Tung University; Department of Applied Chemistry
1-八月-1992DEPOSITION OF SILICON-CARBIDE THIN-FILMS FROM 1,1-DIMETHYL-1-SILACYCLOBUTANECHIU, HT; LEE, SF; 交大名義發表; 應用化學系; National Chiao Tung University; Department of Applied Chemistry
15-十一月-1991DEPOSITION OF SILICON-CARBIDE THIN-FILMS FROM DODECAMETHYLCYCLOHEXASILANECHIU, HT; LEE, SF; 交大名義發表; 應用化學系; National Chiao Tung University; Department of Applied Chemistry
15-一月-1992DEPOSITION OF TANTALUM NITRIDE THIN-FILMS FROM ETHYLIMIDOTANTALUM COMPLEXCHIU, HT; CHANG, WP; 交大名義發表; 應用化學系; National Chiao Tung University; Department of Applied Chemistry
22-八月-1993DEPOSITION OF THIN-FILMS FROM (TBUN)2MO(NHTBU)2CHIU, HT; HO, WY; 應用化學系; Department of Applied Chemistry
1-九月-1992DIFLUOROSILYLENE AS A PRECURSOR FOR THE CHEMICAL VAPOR-DEPOSITION OF TITANIUM SILICIDECHEN, CC; YU, JL; LEE, CY; LIU, CS; CHIU, HT; 應用化學系; Department of Applied Chemistry
1-五月-1992EFFECT OF HYDROGEN ON DEPOSITION OF TANTALUM NITRIDE THIN-FILMS FROM ETHYLIMIDOTANTALUM COMPLEXCHIU, HT; CHANG, WP; 交大名義發表; 應用化學系; National Chiao Tung University; Department of Applied Chemistry
25-八月-1991ETHYLIMIDOTANTALUM COMPLEX AS PRECURSOR TO TANTALUM NITRIDE THIN-FILMSCHIU, HT; CHANG, WP; 應用化學系; Department of Applied Chemistry
1-九月-1995GROWTH OF TERNARY SI1-X-YGEXCY THIN-FILMS FROM A SINGLE-SOURCE PRECURSOR, GE(SIME(3))(4)CHIU, HT; SHIE, SC; CHUANG, SH; 應用化學系; Department of Applied Chemistry
1-九月-1995GROWTH OF TERNARY SI1-X-YGEXCY THIN-FILMS FROM A SINGLE-SOURCE PRECURSOR, GE(SIME(3))(4)CHIU, HT; SHIE, SC; CHUANG, SH; 交大名義發表; 應用化學系; National Chiao Tung University; Department of Applied Chemistry
15-四月-1993HYDROGEN PLASMA-ENHANCED CHEMICAL VAPOR-DEPOSITION OF SILICON-CARBIDE THIN-FILMS FROM DODECAMETHYLCYCLOHEXASILANECHIU, HT; HUANG, SC; 交大名義發表; 應用化學系; National Chiao Tung University; Department of Applied Chemistry
1-六月-1991LOW-PRESSURE CHEMICAL VAPOR-DEPOSITION OF SILICON-CARBIDE THIN-FILMS FROM ORGANOPOLYSILANESCHIU, HT; WU, PF; 交大名義發表; 應用化學系; National Chiao Tung University; Department of Applied Chemistry
26-八月-1990LOW-PRESSURE CHEMICAL VAPOR-DEPOSITION OF TIN AND ZRN THIN-FILMS FROM TI(NET2)4 AND ZR(NET2)4CHIU, HT; HUANG, CC; 應用化學系; Department of Applied Chemistry
1-四月-1993LOW-PRESSURE CHEMICAL VAPOR-DEPOSITION OF TITANIUM AND ZIRCONIUM CARBONITRIDE THIN-FILMS FROM M(NET2)4 (M = TI AND ZR)CHIU, HT; HUANG, CC; 交大名義發表; 應用化學系; National Chiao Tung University; Department of Applied Chemistry
15-十一月-1994LOW-PRESSURE CHEMICAL-VAPOR-DEPOSITION OF SILICON-CARBIDE THIN-FILMS FROM HEXAMETHYLDISILANECHIU, HT; HSU, JS; 交大名義發表; 應用化學系; National Chiao Tung University; Department of Applied Chemistry
21-八月-1995METALORGANIC CHEMICAL-VAPOR-DEPOSITION OF TANTALUM NITRIDE BY TERTBUTYLIMIDOTRIS(DIETHYLAMIDO)TANTALUM FOR ADVANCED METALLIZATIONTSAI, MH; SUN, SC; CHIU, HT; TSAI, CE; CHUANG, SH; 應用化學系; 電子工程學系及電子研究所; 奈米中心; Department of Applied Chemistry; Department of Electronics Engineering and Institute of Electronics; Nano Facility Center
21-八月-1995METALORGANIC CHEMICAL-VAPOR-DEPOSITION OF TANTALUM NITRIDE BY TERTBUTYLIMIDOTRIS(DIETHYLAMIDO)TANTALUM FOR ADVANCED METALLIZATIONTSAI, MH; SUN, SC; CHIU, HT; TSAI, CE; CHUANG, SH; 應用化學系; 電子工程學系及電子研究所; 奈米中心; Department of Applied Chemistry; Department of Electronics Engineering and Institute of Electronics; Nano Facility Center
1-八月-1994A NOVEL SYNTHESIS OF ORGANOIMIDO COMPLEX BY TRANSAMINATION REACTION - X-RAY CRYSTAL-STRUCTURE OF BIS-(ISOPROPYLIMIDO) COMPLEX OF TUNGSTEN(VI), [W(MU-NPRI)(NPRI)(NHPRI)2]2CHIU, HT; CHUANG, SH; LEE, GH; PENG, SM; 應用化學系; Department of Applied Chemistry
1-十二月-1994SYNTHESES AND X-RAY CRYSTAL-STRUCTURES OF DICHLOROBIS(TERT-BUTYLIMIDO) COMPLEXES OF MOLYBDENUM(VI) - POTENTIAL PRECURSORS TO MOLYBDENUM NITRIDE AND MOLYBDENUM CARBONITRIDECHIU, HT; CHANG, GB; HO, WY; CHUANG, SH; LEE, GH; PENG, SM; 應用化學系; Department of Applied Chemistry
2-四月-1995SYNTHESIS AND CHARACTERIZATION OF N=CR(OTBU)3CHIU, HT; CHEN, YP; LEE, GH; PENG, SM; 應用化學系; Department of Applied Chemistry
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