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公開日期標題作者
1-七月-2009High-Density and Low-Leakage-Current MIM Capacitor Using Stacked TiO(2)/ZrO(2) InsulatorsLin, S. H.; Chiang, K. C.; Chin, Albert; Yeh, F. S.; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
1-七月-2009High-Density and Low-Leakage-Current MIM Capacitor Using Stacked TiO2/ZrO2 InsulatorsLin, S. H.; Chiang, K. C.; Chin, Albert; Yeh, F. S.; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
1-九月-2006High-performance SrTiO3 MIM capacitors for analog applicationsChiang, K. C.; Huang, Ching-Chien; Chen, G. L.; Chen, Wen Jauh; Kao, H. L.; Wu, Yung-Hsien; Chin, Albert; McAlister, Sean P.; 奈米科技中心; Center for Nanoscience and Technology
1-三月-2007High-temperature leakage improvement in metal-insulator-metal capacitors by work-function tuningChiang, K. C.; Cheng, C. H.; Pan, H. C.; Hsiao, N.; Chou, C. P.; Chin, Albert; Hwang, H. L.; 機械工程學系; 電子工程學系及電子研究所; Department of Mechanical Engineering; Department of Electronics Engineering and Institute of Electronics
1-七月-2010Improved Capacitance Density and Reliability of High-k Ni/ZrO(2)/TiN MIM Capacitors Using Laser-Annealing TechniqueTsai, C. Y.; Chiang, K. C.; Lin, S. H.; Hsu, K. C.; Chi, C. C.; Chin, Albert; 電機工程學系; Department of Electrical and Computer Engineering
1-七月-2010Improved Capacitance Density and Reliability of High-k Ni/ZrO2/TiN MIM Capacitors Using Laser-Annealing TechniqueTsai, C. Y.; Chiang, K. C.; Lin, S. H.; Hsu, K. C.; Chi, C. C.; Chin, Albert; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
1-十二月-2009Improved Stress Reliability of Analog Metal-Insulator-Metal Capacitors Using TiO(2)/ZrO(2) DielectricsLin, S. H.; Chiang, K. C.; Yeh, F. S.; Chin, Albert; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
1-十二月-2009Improved Stress Reliability of Analog Metal-Insulator-Metal Capacitors Using TiO2/ZrO2 DielectricsLin, S. H.; Chiang, K. C.; Yeh, F. S.; Chin, Albert; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
1-一月-2006A parallel coupled-line filter using VLSI backend interconnect with high resistivity substrateChen, C. C.; Kao, H. L.; Chiang, K. C.; Chin, Albert; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
1-九月-2006RFIC TaN/SrTio(3)/TaN MIM capacitors with 35 fF/mu m(2) capacitance densityHuang, C. C.; Chiang, K. C.; Kao, H. L.; Chin, Albert; Chen, W. J.; 奈米科技中心; Center for Nanoscience and Technology
1-一月-2010A Study on Frequency-Dependent Voltage Nonlinearity of SrTiO(3) rf CapacitorCheng, C. H.; Huang, C. C.; Hsu, H. H.; Chen, P. C.; Chiang, K. C.; Chin, Albert; Yeh, F. S.; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
1-一月-2010A Study on Frequency-Dependent Voltage Nonlinearity of SrTiO3 rf CapacitorCheng, C. H.; Huang, C. C.; Hsu, H. H.; Chen, P. C.; Chiang, K. C.; Chin, Albert; Yeh, F. S.; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
2007Thermal leakage improvement by using a high-work-function ni electrode in high-kappa TiHfO metal-insulator-metal capacitorsChiang, K. C.; Huang, C. C.; Pan, H. C.; Hsiao, C. N.; Lin, J. W.; Hsieh, I. J.; Cheng, C. H.; Chou, C. P.; Chin, A.; Hwang, H. L.; McAlister, S. P.; 機械工程學系; 奈米科技中心; Department of Mechanical Engineering; Center for Nanoscience and Technology
1-八月-2007Use of a high-work-function ni electrode to improve the stress reliability of Analog SrTiO3 metal-insulator-metal capacitorsChiang, K. C.; Cheng, C. H.; Jhou, K. Y.; Pan, H. C.; Hsiao, C. N.; Chou, C. P.; McAlister, S. P.; Chin, Albert; Hwang, H. L.; 機械工程學系; 電子工程學系及電子研究所; Department of Mechanical Engineering; Department of Electronics Engineering and Institute of Electronics
2007Very high density (44 fF/mu m(2)) SrTiO3 MIM capacitors for RF applicationsChiang, K. C.; Lin, J. W.; Pan, H. C.; Hsiao, C. N.; Chen, W. J.; Kao, H. L.; Hsieh, I. J.; Chin, Albert; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
顯示 1 到 15 筆資料，總共 15 筆