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公開日期
標題
作者
2005
0.1 mu m poly-Si thin film transistors for system-on-panel (SoP) applications
Tsui, BY
;
Lin, CP
;
Huang, CF
;
Xiao, YH
;
電子工程學系及電子研究所
;
Department of Electronics Engineering and Institute of Electronics
2003
Anisotropic thermal conductivity of nano-porous silica film
Tsui, BY
;
Yang, CC
;
Fang, KL
;
電子工程學系及電子研究所
;
Department of Electronics Engineering and Institute of Electronics
1-一月-2004
Anisotropic thermal conductivity of nanoporous silica film
Tsui, BY
;
Yang, CC
;
Fang, KL
;
電子工程學系及電子研究所
;
Department of Electronics Engineering and Institute of Electronics
2005
Characteristics of Modified-Schottky-Barrier (MSB) FinFETs
Lin, CP
;
Tsui, BY
;
電機學院
;
電子工程學系及電子研究所
;
College of Electrical and Computer Engineering
;
Department of Electronics Engineering and Institute of Electronics
1-十月-2004
A comprehensive study on the FIBL of nanoscale MOSFETs
Tsui, BY
;
Chin, LF
;
電子工程學系及電子研究所
;
Department of Electronics Engineering and Institute of Electronics
1-六月-2001
Dielectric and barrier properties of spin-on organic aromatic low dielectric constant polymers FLARE and SiLK
Wu, ZC
;
Shiung, ZW
;
Wu, RG
;
Liu, YL
;
Wu, WH
;
Tsui, BY
;
Chen, MC
;
Chang, W
;
Chou, PF
;
Jang, SM
;
Hu, CH
;
Liang, MS
;
電子工程學系及電子研究所
;
Department of Electronics Engineering and Institute of Electronics
1-八月-2005
Effects of base oxide thickness and silicon composition on charge trapping in HfSiO/SiO(2) high-k gate stacks
Wu, WH
;
Chen, MC
;
Tsui, BY
;
How, YT
;
Yao, LG
;
Jin, Y
;
Tao, HJ
;
Chen, SC
;
Liang, MS
;
電子工程學系及電子研究所
;
Department of Electronics Engineering and Institute of Electronics
1-八月-2005
Effects of base oxide thickness and silicon composition on charge trapping in HfSiO/SiO2 high-k gate stacks
Wu, WH
;
Chen, MC
;
Tsui, BY
;
How, YT
;
Yao, LG
;
Jin, Y
;
Tao, HJ
;
Chen, SC
;
Liang, MS
;
電子工程學系及電子研究所
;
Department of Electronics Engineering and Institute of Electronics
2002
Electrical and material stability of Orion(TM) CVD ultra low-k dielectric film for copper interconnection
Fang, KL
;
Tsui, BY
;
Yang, CC
;
Chen, MC
;
Lee, SD
;
Beekmann, K
;
Tony, W
;
Giles, K
;
Ishaq, S
;
電子工程學系及電子研究所
;
Department of Electronics Engineering and Institute of Electronics
1-一月-2005
Electrical characteristics of thin HfO(2) gate dielectrics prepared using different pre-deposition surface treatments
Chen, CW
;
Chien, CH
;
Perng, TH
;
Yang, MJ
;
Liang, JS
;
Lehnen, P
;
Tsui, BY
;
Chang, CY
;
電子工程學系及電子研究所
;
Department of Electronics Engineering and Institute of Electronics
1-一月-2005
Electrical characteristics of thin HfO2 gate dielectrics prepared using different pre-deposition surface treatments
Chen, CW
;
Chien, CH
;
Perng, TH
;
Yang, MJ
;
Liang, JS
;
Lehnen, P
;
Tsui, BY
;
Chang, CY
;
電子工程學系及電子研究所
;
Department of Electronics Engineering and Institute of Electronics
2000
Electrical reliability issues of integrating low-K dielectrics with Cu metallization
Wu, ZC
;
Shiung, ZW
;
Wang, CC
;
Fang, KL
;
Wu, RG
;
Liu, YL
;
Tsui, BY
;
Chen, MC
;
Chang, W
;
Chou, PF
;
Jang, SM
;
Yu, CH
;
Liang, MS
;
電子工程學系及電子研究所
;
Department of Electronics Engineering and Institute of Electronics
2001
Electrical reliability of low dielectric constant diffusion barrier (a-SiC : H) for copper interconnect
Fang, KL
;
Tsui, BY
;
Yang, CC
;
Lee, SD
;
電子工程學系及電子研究所
;
Department of Electronics Engineering and Institute of Electronics
2005
Electrical stability and reliability of ultralow dielectric constant porous carbon-doped oxide film for copper interconnect
Fang, KL
;
Tsui, BY
;
電子工程學系及電子研究所
;
Department of Electronics Engineering and Institute of Electronics
15-六月-2003
Formation of interfacial layer during reactive sputtering of hafnium oxide
Tsui, BY
;
Chang, HW
;
電子工程學系及電子研究所
;
Department of Electronics Engineering and Institute of Electronics
2004
High thermal stability metal gate with tunable work function
Huang, CF
;
Tsui, BY
;
電子工程學系及電子研究所
;
Department of Electronics Engineering and Institute of Electronics
1-三月-2005
High-performance poly-Si TFTs fabricated by implant-to-silicide technique
Lin, CP
;
Mao, YH
;
Tsui, BY
;
電子工程學系及電子研究所
;
Department of Electronics Engineering and Institute of Electronics
1-五月-2006
High-performance poly-silicon TFTs using HfO2 gate dielectric
Lin, CP
;
Tsui, BY
;
Yang, MJ
;
Huang, RH
;
Chien, CH
;
電子工程學系及電子研究所
;
Department of Electronics Engineering and Institute of Electronics
1-六月-2005
Hot-carrier effects in p-channel modified Schottky-barrier FinFETs
Lin, CP
;
Tsui, BY
;
電子工程學系及電子研究所
;
Department of Electronics Engineering and Institute of Electronics
1-十一月-2001
Impact of interface nature on deep sub-micron Al-plug resistance
Tsui, BY
;
Yang, TJ
;
Ku, TK
;
電子工程學系及電子研究所
;
Department of Electronics Engineering and Institute of Electronics